ETRO VUB
About ETRO  |  News  |  Events  |  Vacancies  |  Contact  
Home Research Education Industry Publications About ETRO

ETRO Publications

Full Details

Conference Publication

First Demonstration of 3D stacked Finfets at a 45nm fin pitch and 110nm gate pitch technology on 300mm wafers

Host Publication: 64th Annual IEEE International Electron Devices Meeting, IEDM 2018

Authors: B. Parvais, L. Peng, L. Teugels, E. Rosseel, A. Vandooren, J. Franco, A. Walke, V. Deshpande, N. Rassoul, G. Hellings, G. Jamieson, F. Inoue, E. Vecchio, T. Zheng, W. Vanherle, A. Hikavyy, G. Mannaert, B. T. Chan, R. Ritzenthaler, J. Mitard, L. Ragnarsson, N. Waldron, V. De Heyn, J. Boemmels, D. Mocuta and N. Collaert

Publisher: Institute of Electrical and Electronics Engineers Inc

Publication Date: Jan. 2019


Abstract:

3 Dstacking using a sequential integration approach is demonstrated for finfet devices on 300mm wafers at a 45nm fin pitch and 110nm poly pitch technology. This demonstrates the compatibility of the 3D sequential approach for aggressive device density stacking at advanced nodes thanks to the tight alignment precision of the first processed top layer to the last processed bottom layer through the top silicon channel and bonding stack during 193nm immersion lithography. The top devices are junction-less devices fabricated at low temperature ( T 525 C) in a top Si layer transferred by wafer-to-wafer bonding with a bonding dielectric stack down to 170nm. The top devices offer similar performance as the high temperature bulk finfet technology for LSTP applications. The use of TiN/TiA1/TiN/HfO 2 gate stack provides the proper threshold voltage adjustment while the insertion of the LaSiO x dipole improves device performance and brings the BTI reliability within specification at low temperature.

Other Reference Styles
Current ETRO Authors

Mr. Bertrand Parvais

+32 (0)

bparvais@etrovub.be

more info

Other Publications

• Journal publications

IRIS • LAMI • AVSP

• Conference publications

IRIS • LAMI • AVSP

• Book publications

IRIS • LAMI • AVSP

• Reports

IRIS • LAMI • AVSP

• Laymen publications

IRIS • LAMI • AVSP

• PhD Theses

Search ETRO Publications

Author:

Keyword:  

Type:








- Contact person

- IRIS

- AVSP

- LAMI

- Contact person

- Thesis proposals

- ETRO Courses

- Contact person

- Spin-offs

- Know How

- Journals

- Conferences

- Books

- Vacancies

- News

- Events

- Press

Contact

ETRO Department

info@etro.vub.ac.be

Tel: +32 2 629 29 30

©2020 • Vrije Universiteit Brussel • ETRO Dept. • Pleinlaan 2 • 1050 Brussels • Tel: +32 2 629 2930 (secretariat) • Fax: +32 2 629 2883 • WebmasterDisclaimer