Electron Beam Lithography System
 
Electron Beam Lithography System 
 
 
Project description 

Micro- and nanotechnology are becoming increasingly important in top research, in fields such as fundamental physics, nanophotonics, nanoelectronics, micro- and nanomechanics, as well as in the bio- and medical sciences and in advanced imaging. Electron beam lithography, in which a focused beam of electrons with nanometer resolution writes into a photosensitive layer, is the most commonly used technology for the initial definition of these patterns. Thereafter, other techniques such as metal deposition or plasma etching can be used to permanently transfer these patterns into the final substrate. While these additional techniques are easily accessible to Flemish researchers, there is currently no easy access to a high-quality electron beam lithography system in Flanders, which increasingly hinders the progress of research in a wide range of domains. We therefore aim to acquire such an electron beam lithography system and integrate it with the existing complementary micro- and nanotechnology infrastructure in Flanders and thus further develop a Flemish center of excellence.