A contactless and nondestructive technique is employed for characterizing single-sided metallised silicon wafers. The reflection spectra are measured using a quasi-optical millmeter-wave setup in the frequency range 40-320 GHz. The results are compared with those provided by the coplanar waveguide method, in terms of accuracy and range of applicability.
Elhawil, A, Neve, CR, Olbrechts, B, Huynen, I, Raskin, J-P, Poesen, G, Stiens, J & Vounckx, R 2010, 'Contactless monitoring of Si substrate permittivity and resistivity from microwave to millimeter wave frequencies', Microwave and Optical Technology Letters, vol. 52, no. 11, pp. 2500-2505.
Elhawil, A., Neve, C. R., Olbrechts, B., Huynen, I., Raskin, J.-P., Poesen, G., Stiens, J., & Vounckx, R. (2010). Contactless monitoring of Si substrate permittivity and resistivity from microwave to millimeter wave frequencies. Microwave and Optical Technology Letters, 52(11), 2500-2505.
@article{617c61d20c214b7d8469d00790662623,
title = "Contactless monitoring of Si substrate permittivity and resistivity from microwave to millimeter wave frequencies",
abstract = "A contactless and nondestructive technique is employed for characterizing single-sided metallised silicon wafers. The reflection spectra are measured using a quasi-optical millmeter-wave setup in the frequency range 40-320 GHz. The results are compared with those provided by the coplanar waveguide method, in terms of accuracy and range of applicability.",
keywords = "MIMIC, monitoring, reflectivity, permittivity, RF, Silicon, contactless, microwaves, millimeter waves, quasi-optical",
author = "Amna Elhawil and C.r. Neve and Benoit Olbrechts and Isabelle Huynen and Jean-Pierre Raskin and Gert Poesen and Johan Stiens and Roger Vounckx",
year = "2010",
month = nov,
day = "11",
language = "English",
volume = "52",
pages = "2500--2505",
journal = "Microwave and Optical Technology Letters",
issn = "0895-2477",
publisher = "John Wiley and Sons Inc.",
number = "11",
}