This study investigates electromigration in a double-redundancy interconnect configuration, commonly found at standard-cell level in the power delivery networks, under downstream electron flow conditions, using both experiments and physics-based simulations. This work sheds light on the critical jL product, (jL)c , in presence of a parallel path. Due to double redundancy, for our samples coming from a 28nm commercial technology node, the critical current density jc was found to increase by 1.15-fold and 1.1-fold, for 5% and 20% R-shift failure criteria, respectively. The impact of line extension on (jL)c was also investigated. A 37% decrease in (jL)c was observed for a single line with a passive line extension acting as a sink, undermining the short-length effect, regardless of the failure criterion. For the same target lifetime, a 1.2-fold increase in maximum allowable current density, based on a 50% target failure percentile and 10 years lifetime criterion, was obtained when comparing the single and double redundancy configurations for 5% R-shift.
Esposto, S, Ciofi, I, Sisto, G, Croes, K, Milojevic, D & Zahedmanesh, H 2025, Impact of Redundancy and Line Extension on Short-Length Effect in Electromigration Reliability. in 2025 IEEE International Interconnect Technology Conference, IITC 2025. 2025 IEEE International Interconnect Technology Conference, IITC 2025, IEEE, pp. 1, 2025 IEEE International Interconnect Technology Conference (IITC), Busan, Korea, Democratic People's Republic of, 2/06/25. https://doi.org/10.1109/IITC66087.2025.11075449
Esposto, S., Ciofi, I., Sisto, G., Croes, K., Milojevic, D., & Zahedmanesh, H. (2025). Impact of Redundancy and Line Extension on Short-Length Effect in Electromigration Reliability. In 2025 IEEE International Interconnect Technology Conference, IITC 2025 (pp. 1). (2025 IEEE International Interconnect Technology Conference, IITC 2025). IEEE. https://doi.org/10.1109/IITC66087.2025.11075449
@inproceedings{5082f9abff574511aa8e8988d1808955,
title = "Impact of Redundancy and Line Extension on Short-Length Effect in Electromigration Reliability",
abstract = "This study investigates electromigration in a double-redundancy interconnect configuration, commonly found at standard-cell level in the power delivery networks, under downstream electron flow conditions, using both experiments and physics-based simulations. This work sheds light on the critical jL product, (jL)c , in presence of a parallel path. Due to double redundancy, for our samples coming from a 28nm commercial technology node, the critical current density jc was found to increase by 1.15-fold and 1.1-fold, for 5% and 20% R-shift failure criteria, respectively. The impact of line extension on (jL)c was also investigated. A 37% decrease in (jL)c was observed for a single line with a passive line extension acting as a sink, undermining the short-length effect, regardless of the failure criterion. For the same target lifetime, a 1.2-fold increase in maximum allowable current density, based on a 50% target failure percentile and 10 years lifetime criterion, was obtained when comparing the single and double redundancy configurations for 5% R-shift.",
author = "Simone Esposto and Ivan Ciofi and Giuliano Sisto and Kristof Croes and Dragomir Milojevic and Houman Zahedmanesh",
note = "Publisher Copyright: {\textcopyright} 2025 IEEE.; 2025 IEEE International Interconnect Technology Conference (IITC), IITC ; Conference date: 02-06-2025 Through 05-06-2025",
year = "2025",
month = jul,
day = "16",
doi = "10.1109/IITC66087.2025.11075449",
language = "English",
series = "2025 IEEE International Interconnect Technology Conference, IITC 2025",
publisher = "IEEE",
pages = "1",
booktitle = "2025 IEEE International Interconnect Technology Conference, IITC 2025",
url = "https://ieeexplore.ieee.org/document/11075449",
}