Contactless monitoring of Si substrate permittivity and resistivity from microwave to millimeter wave frequencies
 
Contactless monitoring of Si substrate permittivity and resistivity from microwave to millimeter wave frequencies 
 
Amna Elhawil, C.r. Neve, Benoit Olbrechts, Isabelle Huynen, Jean-Pierre Raskin, Gert Poesen, Johan Stiens, Roger Vounckx
 
Abstract 

A contactless and nondestructive technique is employed for characterizing single-sided metallised silicon wafers. The reflection spectra are measured using a quasi-optical millmeter-wave setup in the frequency range 40-320 GHz. The results are compared with those provided by the coplanar waveguide method, in terms of accuracy and range of applicability.