III-V semiconductor-based devices, in particular InP heterojunction bipolar transistors, are a strong contender for next-generation high-speed communication systems. In this paper, we present motivation for the upscaling of III-V technology on to 300 mm Si platforms. A comparison of various options for such III-V on Si technology is described. The challenges in the way to achieve its integration into existing CMOS platform and possibilities to overcome them are shown. We describe imec's path to demonstrate a CMOS compatible III-V-on-300 mm Si technology with the most recent results.