In this paper, the performance of standard cells scaled down to 4.5 metal tracks based on Lateral NanoSheets is investigated for 3nm technology node targets using relevant logic benchmarks and power-aware metrics. The cell layout and parasitics in 4.5T cells set strong constraints on the NanoSheets geometry. The optimized NanoSheets could still outperform FinFETs by 9 to 20% frequency depending on circuit context, reaching 3nm node targets. An extra 21% performance improvement is expected with device level boosters enablement.