Short-channel Gallium Nitride (GaN) high-electron-mobility transistors (HEMTs) often utilize T-shape gates due to their large gate-line cross-sectional area and subsequent fMAX increase. In this paper, we report the linearity trade-offs associated with varying the T-gate geometries of AlGaN/GaN HEMTs on Si, specifically the gate extensions which serve as field plates and their impact on the large-signal performance. Small-signal characterization and modeling, in addition to TCAD, provide initial guidelines for the optimal dimensions for the gate field plates using the ratio of fT and the product of the gate resistance and the gate-to-drain capacitance. We utilize various characterization methods, including 6 GHz non-linear vector network analyzer characterization in addition to load-pull, to quantify the amplitude and phase distortion and their subsequent impact on the large-signal metrics of the devices under differing matching conditions and bias points. We deduce that the influence of the gate field plates on the amplitude and phase distortion is non-negligible, particularly under matched conditions.
ElKashlan, R, Khaled, A, Rodriguez, R, Sibaja-Hernandez, A, Peralagu, U, Alian, A, Collaert, N , Wambacq, P & Parvais, B 2023, ' RF linearity trade-offs for varying T-gate geometries of GaN HEMTs on Si ', International Journal of Microwave and Wireless Technologies , vol. 67, pp. 1-10.
ElKashlan, R., Khaled, A., Rodriguez, R., Sibaja-Hernandez, A., Peralagu, U., Alian, A., Collaert, N. , Wambacq, P. , & Parvais, B. (2023). RF linearity trade-offs for varying T-gate geometries of GaN HEMTs on Si . International Journal of Microwave and Wireless Technologies , 67 , 1-10.
@article{4bbbb57ced3b4f04ac4875e41d4aa05b,
title = " RF linearity trade-offs for varying T-gate geometries of GaN HEMTs on Si " ,
abstract = " Short-channel Gallium Nitride (GaN) high-electron-mobility transistors (HEMTs) often utilize T-shape gates due to their large gate-line cross-sectional area and subsequent fMAX increase. In this paper, we report the linearity trade-offs associated with varying the T-gate geometries of AlGaN/GaN HEMTs on Si, specifically the gate extensions which serve as field plates and their impact on the large-signal performance. Small-signal characterization and modeling, in addition to TCAD, provide initial guidelines for the optimal dimensions for the gate field plates using the ratio of fT and the product of the gate resistance and the gate-to-drain capacitance. We utilize various characterization methods, including 6 GHz non-linear vector network analyzer characterization in addition to load-pull, to quantify the amplitude and phase distortion and their subsequent impact on the large-signal metrics of the devices under differing matching conditions and bias points. We deduce that the influence of the gate field plates on the amplitude and phase distortion is non-negligible, particularly under matched conditions. " ,
keywords = " Gallium Nitride high-electron-mobility transistors on Si, Microwave measurements " ,
author = " Rana ElKashlan and Ahmad Khaled and Raul Rodriguez and Arturo Sibaja-Hernandez and Uthayasankaran Peralagu and AliReza Alian and Nadine Collaert and Piet Wambacq and Bertrand Parvais " ,
note = " Publisher Copyright: Copyright { extcopyright} The Author(s), 2023. Published by Cambridge University Press in association with the European Microwave Association. Copyright: Copyright 2023 Elsevier B.V., All rights reserved. " ,
year = " 2023 " ,
month = mar,
day = " 20 " ,
doi = " 10.1017/S1759078722001428 " ,
language = " English " ,
volume = " 67 " ,
pages = " 110 " ,
journal = " International Journal of Microwave and Wireless Technologies " ,
issn = " 1759-0787 " ,
publisher = " Cambridge University Press " ,
}