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Yi Yang, Yi Yang, Hao Yu, Hao Yu, Meng-Che Tsai, Meng-Che Tsai, Wei-Tung Lin, Wei-Tung Lin, Ying-Chun Kuo, Ying-Chun Kuo, Barry O Sullivan, Barry O Sullivan, Aarti Rathi, Aarti Rathi, Amratansh Gupta, Amratansh Gupta, Sachin Yadav, Sachin Yadav, Alireza Alian, Alireza Alian, Uthayasankaran Peralagu, Uthayasankaran Peralagu, Bertrand Parvais, Bertrand Parvais, Nadine Collaert, Nadine Collaert, Tian-Li Wu, Tian-Li Wu
 

Chapter in Book/ Report/ Conference proceeding

Abstract 

This study examines the stability of RF MISHEMTs under ON, SEMI-ON, and OFF-state pulses with insitu SiN thicknesses scaled from 10nm to 1nm, compared to RF Schottky HEMTs. While stability is maintained under ON state pulses, significant degradation is observed under SEMION and OFF-state pulses, particularly in devices with a 1 nm in-situ SiN layer (M1). The high interface trap density (Nit) and inadequate passivation of the M1 sample contribute to the observed current degradation. EDX analysis suggests a rough interface in M1, likely due to non-uniform SiN growth or SiN/Al2O3 intermixing.

Reference