In this paper, ZnO films were deposited on the surface of few-layer graphene films by RF magnetron sputtering and its photoluminescence performance was studied. Large-area few-layer graphene films were prepared on a Cu substrate by CVD. To improve the crystalline quality and c-axis preferred growth orientation of ZnO films, we systematically optimized the process parameters (RF power, working pressure, substrate temperature, the flow ratio of Ar and O2) of growing ZnO on graphene films. After optimizing the growth process of ZnO on the graphene surface, the enhancement effect of graphene film on the PL properties of the ZnO layer was studied. We explored the influence of ZnO thickness on the PL performance. On the one hand, the optimal process parameters of growing ZnO on the surface of graphene films by magnetron sputtering were investigated; on the other hand, the sputtering time was optimized to make the composite films have the strongest UV emission performance with the lowest visible range.
Cheng, C, Stiens, J, Hauffman, T, Pletincx, S & Revilla, RI 2020, 'Exploration and mechanism analysis: The maximum ultraviolet luminescence limits of ZnO/few-layer graphene composite films', Applied Surface Science, vol. 503, no. 144169, 144169, pp. 1-9. https://doi.org/10.1016/j.apsusc.2019.144169
Cheng, C., Stiens, J., Hauffman, T., Pletincx, S., & Revilla, R. I. (2020). Exploration and mechanism analysis: The maximum ultraviolet luminescence limits of ZnO/few-layer graphene composite films. Applied Surface Science, 503(144169), 1-9. Article 144169. https://doi.org/10.1016/j.apsusc.2019.144169
@article{c23b7b7fde5a45639c6514a89411e534,
title = "Exploration and mechanism analysis: The maximum ultraviolet luminescence limits of ZnO/few-layer graphene composite films",
abstract = "In this paper, ZnO films were deposited on the surface of few-layer graphene films by RF magnetron sputtering and its photoluminescence performance was studied. Large-area few-layer graphene films were prepared on a Cu substrate by CVD. To improve the crystalline quality and c-axis preferred growth orientation of ZnO films, we systematically optimized the process parameters (RF power, working pressure, substrate temperature, the flow ratio of Ar and O2) of growing ZnO on graphene films. After optimizing the growth process of ZnO on the graphene surface, the enhancement effect of graphene film on the PL properties of the ZnO layer was studied. We explored the influence of ZnO thickness on the PL performance. On the one hand, the optimal process parameters of growing ZnO on the surface of graphene films by magnetron sputtering were investigated; on the other hand, the sputtering time was optimized to make the composite films have the strongest UV emission performance with the lowest visible range.",
keywords = "Chemical vapor deposition, Photoluminescence, Sputtering, Composite films",
author = "Chen Cheng and Johan Stiens and Tom Hauffman and Sven Pletincx and Revilla, {Reynier I.}",
note = "Funding Information: This work was supported by the National Natural Science Foundation of China (Grants 61306009 , 61405159 and 61701402 ), the Key Program for International Science and Technology Cooperation Projects of Shaanxi Province ( 2018KWZ-08 ), the Natural Science Foundation of Shaanxi Province (Grants 2017JM5135 , and 2018JM6046 ), the author at the first position also acknowledge the financial support from the program of China Scholarships Council (CSC) No. 201806970022 . The authors of Vrije Universiteit Brussel (VUB) acknowledge the funding by the SRP-project M3D2, and the ETRO-IOF 242 project. Appendix A Publisher Copyright: {\textcopyright} 2019 Elsevier B.V.",
year = "2020",
month = feb,
day = "15",
doi = "10.1016/j.apsusc.2019.144169",
language = "English",
volume = "503",
pages = "1--9",
journal = "Applied Surface Science",
issn = "0169-4332",
publisher = "Elsevier",
number = "144169",
}