Min Tu, Benzheng Xia, Dmitry E. Kravchenko, Max Lutz Tietze, Alexander John Cruz, Ivo Stassen, Tom Hauffman, Joan Teyssandier, Steven De Feyter, Zheng Wang, Roland A. Fischer, Benedetta Marmiroli, Heinz Amenitsch, Ana Torvisco, Miriam de J. Velásquez-Hernández, Paolo Falcaro, Rob Ameloot
Metal–organic frameworks (MOFs) offer disruptive potential in micro- and optoelectronics because of the unique properties of these microporous materials. Nanoscale patterning is a fundamental step in the implementation of MOFs in miniaturized solid-state devices. Conventional MOF patterning methods suffer from low resolution and poorly defined pattern edges. Here, we demonstrate the resist-free, direct X-ray and electron-beam lithography of MOFs. This process avoids etching damage and contamination and leaves the porosity and crystallinity of the patterned MOFs intact. The resulting high-quality patterns have excellent sub-50-nm resolution, and approach the mesopore regime. The compatibility of X-ray and electron-beam lithography with existing micro- and nanofabrication processes will facilitate the integration of MOFs in miniaturized devices.
Tu, M, Xia, B, Kravchenko, DE, Tietze, ML, Cruz, AJ, Stassen, I, Hauffman, T, Teyssandier, J, De Feyter, S, Wang, Z, Fischer, RA, Marmiroli, B, Amenitsch, H, Torvisco, A, Velásquez-Hernández, MDJ, Falcaro, P & Ameloot, R 2021, 'Direct X-ray and electron-beam lithography of halogenated zeolitic imidazolate frameworks', Nature Materials, vol. 20, no. 1, pp. 93-99. https://doi.org/10.1038/s41563-020-00827-x
Tu, M., Xia, B., Kravchenko, D. E., Tietze, M. L., Cruz, A. J., Stassen, I., Hauffman, T., Teyssandier, J., De Feyter, S., Wang, Z., Fischer, R. A., Marmiroli, B., Amenitsch, H., Torvisco, A., Velásquez-Hernández, M. D. J., Falcaro, P., & Ameloot, R. (2021). Direct X-ray and electron-beam lithography of halogenated zeolitic imidazolate frameworks. Nature Materials, 20(1), 93-99. https://doi.org/10.1038/s41563-020-00827-x
@article{7a6d88a00e0b4934992b831b03baa68c,
title = "Direct X-ray and electron-beam lithography of halogenated zeolitic imidazolate frameworks",
abstract = "Metal–organic frameworks (MOFs) offer disruptive potential in micro- and optoelectronics because of the unique properties of these microporous materials. Nanoscale patterning is a fundamental step in the implementation of MOFs in miniaturized solid-state devices. Conventional MOF patterning methods suffer from low resolution and poorly defined pattern edges. Here, we demonstrate the resist-free, direct X-ray and electron-beam lithography of MOFs. This process avoids etching damage and contamination and leaves the porosity and crystallinity of the patterned MOFs intact. The resulting high-quality patterns have excellent sub-50-nm resolution, and approach the mesopore regime. The compatibility of X-ray and electron-beam lithography with existing micro- and nanofabrication processes will facilitate the integration of MOFs in miniaturized devices.",
author = "Min Tu and Benzheng Xia and Kravchenko, {Dmitry E.} and Tietze, {Max Lutz} and Cruz, {Alexander John} and Ivo Stassen and Tom Hauffman and Joan Teyssandier and {De Feyter}, Steven and Zheng Wang and Fischer, {Roland A.} and Benedetta Marmiroli and Heinz Amenitsch and Ana Torvisco and Vel{\'a}squez-Hern{\'a}ndez, {Miriam de J.} and Paolo Falcaro and Rob Ameloot",
note = "Funding Information: M.T. acknowledges the financial support from a Marie Sk\u0142odowska\u2010Curie Individual Fellowship (no. 708439, VAPOMOF). R.A. acknowledges funding from the European Research Council (no. 716472, VAPORE) and the Research Foundation Flanders (FWO) for funding in the research projects G083016N and 1501618N and the infrastructure project G0H0716N. P.F. acknowledges funding from the European Research Council (no. 771834, POPCRYSTAL) and LP-03. J.T. and S.D.F. acknowledge support by FWO and KU Leuven internal funds. M.L.T. acknowledges the financial support from an FWO senior postdoctoral fellowship (12ZK720N). D.E.K. acknowledges the Marie Sk\u0142odowska-Curie Training Network (no. 765378, HYCOAT) for the financial support. This work was additionally supported (Z.W. and R.A.F.) by the DFG Priority Program 1982 COORNETs (www.coornets.tum.de). This research project has received funding from the EU\u2019s H2020 framework programme for research and innovation under grant agreements 801464 FETOPEN-1-2016-2017 and 654360 NFFA-Europe (proposal IDs 399, 462, 589, 596 and 854). T. Stassin and J. Marreiros are acknowledged for the help and discussions regarding the SAXS measurements. We thank E. Hedlund and M. Roeffaers for the assistance with the installation of the diffraction grating sensor setup, B. Raes and J. van de Vondel for the help with the EBL tool and M. Krishtab for the discussion on MOFs for low-k dielectrics. Publisher Copyright: {\textcopyright} 2020, The Author(s), under exclusive licence to Springer Nature Limited.",
year = "2021",
month = jan,
doi = "10.1038/s41563-020-00827-x",
language = "English",
volume = "20",
pages = "93--99",
journal = "Nature Materials",
issn = "1476-1122",
publisher = "Nature Publishing Group",
number = "1",
}